Semi mf1618 practice for determination of uniformity of thin films on silicon
[DOC File]SEMI M1-0915
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SEMI MF1618 — Practice for Determination of Uniformity of Thin Films on Silicon Wafers. SEMI MF1810 — Test Method for Counting Preferentially Etched or Decorated Surface Defects in Silicon Wafers. ANSI Standard1. ANSI/ASME B46.1 — Surface Texture (Surface Roughness, Waviness, and Lay) ISO Standards5
[DOC File]Background Statement for SEMI Draft Document XXXX
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SEMI MF1618 — Practice for Determination of Uniformity of Thin Films on Silicon Wafers. SEMI MF1810 — Test Method for Counting Preferentially Etched or Decorated Surface Defects in Silicon Wafers. ANSI Standard1. ANSI/ASME B46.1 — Surface Texture (Surface Roughness, Waviness, and Lay) ISO Standards5
[DOC File]A&R Template 4.4
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4933 Revision to SEMI MF1618-0704, Practice For Determination Of Uniformity Of Thin Films On Silicon Wafers II. Tally (Staff to fill in) Voting Tally: As-cast tally after close of voting period. A minimum of 60% of the voting interests that have voting members within the technical committee must return votes. (Regulations ¶ 9.6.1)
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